X-ray microscopy in Zernike phase contrast mode at 4 keV photon energy with 60 nm resolution
2003 | conference paper. A publication with affiliation to the University of Göttingen.
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X-ray microscopy in Zernike phase contrast mode at 4 keV photon energy with 60 nm resolution
Neuhausler, U.; Schneider, G.; Ludwig, W.-D.; Meyer, M. A.; Zschech, E. & Hambach, D. (2003)
Journal of Physics D Applied Physics, 36(10A) pp. A79-A82. X-TOP 2002 Conference, GRENOBLE, FRANCE.
Bristol: Iop Publishing Ltd. DOI: https://doi.org/10.1088/0022-3727/36/10A/316
Documents & Media
Details
- Authors
- Neuhausler, U.; Schneider, G.; Ludwig, Wolf-Dieter; Meyer, M. A.; Zschech, E.; Hambach, D.
- Abstract
- We report on x-ray microscopy of advanced microelectronic devices imaged in Zernike-type phase contrast mode at 4 keV photon energy. Fresnel zone plates were used as high resolution x-ray objectives providing 60 nm spatial resolution. Integrated circuit copper interconnect structures were imaged in positive as well as negative phase contrast. In both cases the phase contrast in the x-ray images is about five times higher than the pure absorption contrast.
- Issue Date
- 2003
- Status
- published
- Publisher
- Iop Publishing Ltd
- Journal
- Journal of Physics D Applied Physics
- Conference
- X-TOP 2002 Conference
- Conference Place
- GRENOBLE, FRANCE
- ISSN
- 0022-3727
