Nanofabrication of spin-transfer torque devices by a polymethylmethacrylate mask one step process: Giant magnetoresistance versus single layer devices
2007 | journal article. A publication with affiliation to the University of Göttingen.
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Nanofabrication of spin-transfer torque devices by a polymethylmethacrylate mask one step process: Giant magnetoresistance versus single layer devices
Parge, A.; Niermann, T.; Seibt, M. & Muenzenberg, M. G. (2007)
Journal of Applied Physics, 101(10) art. 104302. DOI: https://doi.org/10.1063/1.2717544
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Details
- Authors
- Parge, Anne; Niermann, Tore; Seibt, Michael; Muenzenberg, Markus G.
- Abstract
- We present a method to prepare magnetic spin torque devices of low specific resistance in a one step lithography process. The quality of the pillar devices is demonstrated for a standard magnetic double layer device. For single layer devices, we found hysteretic switching and a more complex dynamical excitation pattern in higher fields. A simple model to explain the resistance spikes is presented. (c) 2007 American Institute of Physics.
- Issue Date
- 2007
- Status
- published
- Publisher
- Amer Inst Physics
- Journal
- Journal of Applied Physics
- ISSN
- 0021-8979
