In situ monitoring of atomic layer epitaxy via optical ellipsometry
2018 | journal article; research paper. A publication with affiliation to the University of Göttingen.
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- Authors
- Lyzwa, F.; Marsik, P.; Roddatis, V. ; Bernhard, C. ; Jungbauer, M.; Moshnyaga, V.
- Abstract
- Abstract We report on the use of time-resolved optical ellipsometry to monitor the deposition of single atomic layers with subatomic sensitivity. Ruddlesden–Popper thin films of SrO(SrTiO3)n=4 were grown by means of metalorganic aerosol deposition in the atomic layer epitaxy mode on SrTiO3(1 0 0), LSAT(1 0 0) and DyScO3(1 1 0) substrates. The measured time dependences of ellipsometric angles, Δ(t) and Ψ(t), were described by using a simple optical model, considering the sequence of atomic layers SrO and TiO2 with corresponding bulk refractive indices. As a result, valuable online information on the atomic layer epitaxy process was obtained. Ex situ characterization techniques, i.e. transmission electron microscopy, x-ray diffraction and x-ray reflectometry verify the crystal structure and confirm the predictions of optical ellipsometry.
- Issue Date
- 2018
- Publisher
- IOP Publishing
- Journal
- Journal of Physics D: Applied Physics
- Organization
- Institut für Materialphysik
- ISSN
- 0022-3727
- eISSN
- 1361-6463
- Language
- English
- Sponsor
- EU FP 7 Project ‘IFOX’
Swiss National Foundation